Freunden von diesem Artikel berichten:
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier R 1st ed. 2018 edition
Cheng
Zu deiner iMusic Wunschliste hinzufügen
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier R 1st ed. 2018 edition
Cheng
This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material.
137 pages, 103 Illustrations, black and white; XVIII, 137 p. 103 illus.
| Medien | Bücher Buch |
| Erscheinungsdatum | 18. September 2017 |
| ISBN13 | 9789811061646 |
| Verlag | Springer Verlag, Singapore |
| Seitenanzahl | 137 |
| Maße | 399 g |
Alle anzeigen
Weitere Titel von Cheng
![Cover for Cheng · The Psychology of Social Status (Taschenbuch) [1st ed. 2014 edition] (2016)](https://imusic.b-cdn.net/images/item/original/961/9781493939961.jpg?cheng-2016-the-psychology-of-social-status-taschenbuch&class=scaled&v=1517594627)
![Cover for Cheng · Global Production and Trade in East Asia (Gebundenes Buch) [2001 edition] (2001)](https://imusic.b-cdn.net/images/item/original/308/9780792373308.jpg?cheng-2001-global-production-and-trade-in-east-asia-gebundenes-buch&class=scaled&v=1492592018)
Alle Titel von Cheng ansehen ( u. a. Buch , Gebundenes Buch , CD und Taschenbuch )